Makara Journal of Technology
Vol. 16, No. 2

Effects of Deposition Parameters and Oxygen Addition on Properties of Sputtered Indium Tin Oxide Films

Munir, Badrul (Unknown)
Wibowo, Rachmat Adhi (Unknown)
Ho, Kim Kyoo (Unknown)

Article Info

Publish Date
02 Nov 2012

Abstract

Indium tin oxide (ITO) films were sputtered on corning glass substrate. Oxygen admixture and sputtering deposition parameters were optimized to obtain the highest transparency as well as lowest resistivity. Structural, electrical and optical properties of the films were then examined. Increasing deposition rate and film thickness changed the crystallographic orientation from (222) to (400) and (440), as well as higher surface roughness. It was necessary to apply substrate heating during reposition to get films with better crystallinity. The lowest resistivity of 5.36 x 10-4 Ω•cm was obtained at 750 nm film thickness. The films’ resistivity was increased by addition of oxygen up to 2% in the argon sputtering gas. All films showed over 85% transmittance in the visible wavelength range, possible for applications in photovoltaic and display devices.

Copyrights © 2012




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Journal Info
Makara Journal of Technology
Website

Abbrev

publication:mjt

Publisher

Universitas Indonesia

Subject

Chemical Engineering, Chemistry & Bioengineering Civil Engineering, Building, Construction & Architecture Electrical & Electronics Engineering Engineering Materials Science & Nanotechnology Mechanical Engineering

Description

MAKARA Journal of Technology is a peer-reviewed multidisciplinary journal committed to the advancement of scholarly knowledge and research findings of the several branches of Engineering and Technology. The Journal publishes new results, original articles, reviews, and research notes whose content ...