Makara Journal of Science
Vol. 15, No. 2

BAND ALIGNMENT OF ULTRATHIN GIZO/SiO2/Si HETEROSTRUCTURE DETERMINED BY ELECTRON SPECTROSCOPY

Tahir, Dahlang (Unknown)
Ilyas, Sri Dewi Astuty (Unknown)
Kang, Hee Jae (Unknown)



Article Info

Publish Date
25 Nov 2011

Abstract

Amorphous GaInZnO (GIZO) thin films are grown on SiO2/Si substrate by the RF magnetron sputtering method. By the combination of measured band gaps from reflection energy loss spectroscopy (REELS) spectra and valence band from X-ray photo-electron spectroscopy (XPS) spectra, we have demonstrated the energy band alignment of GIZO thin films. The band gap values are 3.2 eV, 3.2 eV, 3.4eV and 3.6eV for the concentration ratios of Ga: In: Zn in GIZO thin films are 1:1:1, 2:2:1, 3:2:1 and 4:2:1, respectively. These are attributed to the larger band gap energy of Ga2O3 compared with In2O3 and ZnO. The valence band offsets (ΔEv) decrease from 2.18 to 1.68 eV with increasing amount of Ga in GIZO thin films for GIZO1 to GIZO4, respectively. These experimental values of band gap and valence band offset will provide the further understanding in the fundamental properties of GIZO/SiO2/Si heterostructure, which will be useful in the design, modeling and analysis of the performance devices applications

Copyrights © 2011






Journal Info

Abbrev

publication:science

Publisher

Subject

Description

Makara Journal of Science publishes original research or theoretical papers, notes, and minireviews on new knowledge and research or research applications on current issues in basic sciences, namely: Material Sciences (including: physics, biology, and chemistry); Biochemistry, Genetics, and ...