<![CDATA[This paper introduces an innovative improvement to impressed current cathodic protection (ICCP) systems by integrating a pulse-feeding technique designed to address metal protection degradation during off-potential periods, a common issue in conventional systems. The proposed system enhances the overall effectiveness and reliability of ICCP, providing consistent corrosion protection for critical metal structures. A notable advantage of this method is its simplicity, utilizing a cost-effective microcontroller for pulse feeding. This approach simplifies integration processes and enhances cost-effectiveness, making it an attractive solution for improving cathodic protection system performance without substantial additional costs. The method addresses conventional ICCP weaknesses by applying a high-frequency pulse current during off-potential periods. This reduces excessive negative charge buildup on metal surfaces during interruptions, boosting the system’s effectiveness and stability. Research laboratory experiments were conducted using pulse width modulation (PWM) on an ATmega328P microcontroller to demonstrate the method’s effectiveness. Additionally, an IoT-monitored ICCP system was developed using an ESP32 microcontroller and the Blynk application. Results highlight the superiority of a 50 kHz pulse feeding frequency in preventing corrosion compared to lower frequencies. Overall, this advancement significantly enhances ICCP systems, providing improved corrosion protection and durability in harsh environments.]]>
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