The process of absorption of photons with a certain energy will excite an electronfrom a lower energy state to condition higher energy. To determine these coefficientsexperimentally mainly due to the effects of optical interference patterns transmittance andreflectance. The purpose of this study was to determine the magnitude of absorption of athin layer of In2O3: SnO2 with various levels of oxygen given at the time of deposition. Thecoating process performed 90 weight% In2O3 and 10 wt% SnO2 on glass substrates bysputtering. At the time, the addition of certain oxygen sputtering is 2.50%, 3.70%, 5.10%,6.15% and 8.90% were done deposition at temperatures of 175 0C. The results of theanalysis observed a shift in the interference and transmittance towards shorter wavelengths comparable to the increase in oxygen levels. In the oxygen content is 2.50% and 3.70% absorption coefficient has been rising, but the oxygen content 5.10%, 6.15%and 8.90% coefficient absorpsi began to decline. Treatment oxygen levels duringdeposition of a thin layer of ITO can affect the absorption coefficient of thin layers formed.
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