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Jae Gwan Chung
Analytical Engineering Center, Samsung Advanced Institute of Technology
Astronomy Chemistry Earth & Planetary Sciences Mathematics Physics

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Effect of Chlorine Plasma Treatment on Electronic Properties of GIZO Thin Film Grown on SiO2/Si Substrate Dahlang Tahir; Suhk Kun Oh; Hee Jae Kang; Sung Heo; Jae Gwan Chung; Jae Cheol Lee
Journal of Mathematical and Fundamental Sciences Vol. 45 No. 3 (2013)
Publisher : Institute for Research and Community Services (LPPM) ITB

Show Abstract | Download Original | Original Source | Check in Google Scholar | DOI: 10.5614/j.math.fund.sci.2013.45.3.1

Abstract

The effect of chlorine plasma treatment on electronic properties of GIZO grown on SiO2/Si by RF magnetron sputtering was investigated using X-ray photoelectron spectroscopy (XPS), reflection electron energy loss spectroscopy (REELS), and secondary ion mass spectroscopy (SIMS). SIMS depth profiles indicated that the concentration of InO and ZnO on the surface was decreased after Cl2 plasma treatment. REELS data showed that the band gap increased from 3.4 to 3.7 eV. XPS showed that Ind5/2 and Zn2p3/2 shifted to the higher binding energies by 0.5 eV and 0.3 eV, respectively. These phenomena were caused by oxygen deficiency and hydrocarbon contamination reduction as indicated by Cl atom bonding with In and Zn cations that are present on the surface after Cl2 plasma treatment.
Co-Authors Dahlang Tahir Hee Jae Kang Jae Cheol Lee Suhk Kun Oh Sung Heo