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All Journal JKIE (Journal Knowledge Industrial Engineering)
Evgeny L. Pankratov
Nizhny Novgorod State University, Russia
Control & Systems Engineering Decision Sciences, Operations Research & Management Engineering Industrial & Manufacturing Engineering Mechanical Engineering

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An approach for prognosis of manufacturing of comparator with account missmatch-induced stress. On increasing of density of elements Evgeny L. Pankratov

Publisher : Department of Industrial Engineering - Universitas Yudharta Pasuruan

Show Abstract | Download Original | Original Source | Check in Google Scholar | DOI: 10.35891/jkie.v8i1.2482

Abstract

In this paper we introduce an approach to increase density of field-effect transistors framework low-power dynamic comparator used in the far-end and near-end crosstalk adaptation loop. Based on this approach one shall manufacture a heterostructure with specific sections in epitaxial layer. These sections should be doped by diffusion or ion implantation. Doping procedure finishing by optimized annealing. During analysis of manufacturing of the considered comparator we find an approach for decreasing mismatch-induced stress. Also we consider an approach for analytical modeling of heat and mass transport during manufacturing of the considered comparator and other integrated circuits.
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