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All Journal Ganendra: Majalah IPTEK Nuklir
Shunya Yamamoto
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GAS SENSING PROPERTIES OF RUTILE-TiO2 (100) FILMS PREPARED BY PULSED LASER DEPOSITION Bambang Siswanto; Shunya Yamamoto; Masahito Yoshikawa
GANENDRA Majalah IPTEK Nuklir Volume 11 Nomor 2 Juli 2008
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Show Abstract | Download Original | Original Source | Check in Google Scholar | Full PDF (254.547 KB) | DOI: 10.17146/gnd.2008.11.2.139

Abstract

gas sensing property of TiO2 thin films have been demonstrated in rutile-TiO2 (100) films grown on the a-Al2O3 (0001)substrates by Pulsed Laser Deposition (PLD). High quality rutile-TiO2 (100) films were successfully grown on a-Al2O3(0001) with the substrate temperature at 500oC under 15 mTorr of O2 gas pressure. The thickness and crystallinity ofTiO2 films were evaluated by Rutherford backscattering spectrometry combined with channeling (RBS/C) and X-raydiffraction using q-2q scans. To evaluate CO2 gas sensing property of TiO2 films, the dependence of the changing ofelectrical resistivity on the temperature was measured. It’s found that high crystallinity rutile-TiO2 (100) films on the a-Al2O3 (0001) substrate kept at 100oC exhibits good gas sensing property for CO2 gas.Keywords: X-ray diffraction, laser epitaxial, TiO2 thin film, electrical resistivity, CO2
Co-Authors Bambang Siswanto Masahito Yoshikawa