Plasma-Enhanced Chemical Vapor Deposition of Indene for Gas Separation Membrane

Myat Kyaw (Department of Chemical Engineering, Mandalay Technological University, Mandalay 05072, Myanmar Chemical Engineering Department, De La Salle University, 2401 Taft Ave, Manila 0922, Philippines)
Shinsuki Mori (Department of Chemical Engineering, Tokyo Institute of Technology, Tokyo 152-8552, Japan)
Nathaniel Dugos (Chemical Engineering Department, De La Salle University, 2401 Taft Ave, Manila 0922, Philippines)
Susan Roces (Chemical Engineering Department, De La Salle University, 2401 Taft Ave, Manila 0922, Philippines)
Arnel Beltran (Chemical Engineering Department, De La Salle University, 2401 Taft Ave, Manila 0922, Philippines)
Shunsuke Suzuki (Department of Chemical Engineering, Tokyo Institute of Technology, Tokyo 152-8552, Japan)

ASEAN Journal of Chemical Engineering
Vol 19, No 1 (2019)

Polyindene (PIn) membrane was fabricated onto a zeolite 5A substrate by using plasma-enhanced chemical vapor deposition (PECVD) at low temperature. Membrane characterization was done by taking Scanning Electron Microscopy (SEM) and FT-IR measurements and the new peak was found in the plasma-derived PIn film. Membrane performance was analyzed by checking permeability of pure gases (H2, N2, and CO2) through the membrane. PECVD-derived PIn membrane showed high gas barrier properties and selectivities of 8.2 and 4.0 for H2/CO2 and H2/N2, respectively, at room temperature