Arsenic Irradiation Induced Atomic Interdiffusion of InxGa1-xAs/InP Quantum Well Structures

P.L. Gareso (Department of Physics, Faculty of Mathematics and Natural Sciences, Hasanuddin University Jl. Perintis Kemerdekaan Km 10,Makassar 90245, Indonesia)
H.H. Tan (Department of Electronic Materials Engineering, Research School of Physical Sciences and Engineering The Australian National University, Canberra ACT 0200, Australia)
C. Jagadish (Department of Electronic Materials Engineering, Research School of Physical Sciences and Engineering The Australian National University, Canberra ACT 0200, Australia)

Atom Indonesia Journal
Vol 38, No 3 (2012): December 2012

The atomic intermixing of InxGa1-xAs/InP quantum well structures induced by arsenic irradiation has been investigated using photoluminescence (PL) measurement. The ion doses used were varried from 5x1011 As/cm2 to 1x1013 As/cm2. Also, the irradiation temperature were carried out from -200oC to 300oC. The samples were annealed under Argon flow in rapid thermal annealer (RTA) at 750oC for 60 second. The photoluminescence result showed that there was increase in energy shift at lower doses. However, the energy shift was saturated at higher dose. At elevated temperature implantation showed that the energy shift did not change significantly for all the samples (LM, TS, CS). In additon to this, the higher energy shift was observed in the Compressive Strain (CS) samples, but the lower of the energy shift was experienced in the Tensile Strain (TS) samples. Received: 06 September 2012; Revised: 27 November 2012; Accepted: 03 December 2012