International Journal of Reconfigurable and Embedded Systems (IJRES)
Vol 9, No 1: March 2020

Surface potential modeling of dual metal gate-graded channel-dual oxide thickness with two dielectric constant different of surrounding gate MOSFET

Hind Jaafar (Sultan Moulay Slimane University)
Abdellah Aouaj (Sultan Moulay Slimane University)
A. Bouziane (Sultan Moulay Slimane University)
Benjamin Iñiguez (Universitat Rovira i Virgili)



Article Info

Publish Date
01 Mar 2020

Abstract

An Analytical study for the surface potential, threshold voltage and Subthreshold swing (SS) of Dual-metal Gate Graded channel and Dual Oxide Thickness with two dielectric constant different cylindrical gate surrounding-gate (DMG-GC-DOTTDCD) metal–oxide–semiconductor field-effect transistors (MOSFETs) is proposed to investigate short-channel effects (SCEs). The performance of the modified structure was studied by developing physics-based analytical models for the surface potential, threshold voltage shift, and Subthreshold swing. It is shown that the novel MOSFET could significantly reduce threshold voltage shift and Subthreshold swing, can also provides improved electron transport and reduced short channel effects (SCE). Results reveal that the DMG-GC-DOTTDCD devices with different dielectric constant offer superior characteristics as compared to DMG-GC-DOT devices. The derived analytical models agree well with simulation by ATLAS.

Copyrights © 2020






Journal Info

Abbrev

IJRES

Publisher

Subject

Economics, Econometrics & Finance

Description

The centre of gravity of the computer industry is now moving from personal computing into embedded computing with the advent of VLSI system level integration and reconfigurable core in system-on-chip (SoC). Reconfigurable and Embedded systems are increasingly becoming a key technological component ...