STRUCTURAL AND MAGNETIC PROPERTIES OF FE/SI MULTILAYER GROWN BY HELICON PLASMA SPUTTERING

Setyo Purwanto (R&D Centrefor Materials Science and Technology-BA TAN Kawasan Puspiptek, Serpong, Tangerang 15314)
Isao Sakamoto (Photonics Research Institute, AIST—JAPAN')
M. Koike (Photonics Research Institute, AIST—JAPAN')
H. Tanoue (Photonics Research Institute, AIST—JAPAN')

Jurnal Sains Materi Indonesia
Vol 5, No 1: OKTOBER 2003

STRUCTURAL AND MAGNETIC PROPERTIES OF FE/SI MULTILAYER GROWN BY HELICON PLASMA SPUTTERING. Helicon plasma sputtering method has been used to grown the Fe/Si multilayer (MLs) with various thickness of Silicon spacer around 0.5 ~ 2nm for Fe thickness fixed at 2nm in order to investigated the antiferromagnetic coupling behaviour. Also we grown the MLs with various Fe thickness around 2-5nm for Silicon spacer fixed at tSi =l nm and l.5nm. Present study found that in case of Silicon spacer thickness tSi= l nm multilayer film exhibit antiferromagnetically ordering, beside this thickness the MLs are ferromagnetic. The maximum magnetoresistance ratio is 0.22%, it appears at the Fe thickness tFe=3nm and Si thickness tSi=l nm.