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M. Koike
Photonics Research Institute, AIST—JAPAN'
Materials Science & Nanotechnology

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STRUCTURAL AND MAGNETIC PROPERTIES OF FE/SI MULTILAYER GROWN BY HELICON PLASMA SPUTTERING Setyo Purwanto; Isao Sakamoto; M. Koike; H. Tanoue
Jurnal Sains Materi Indonesia Vol 5, No 1: OKTOBER 2003
Publisher : Center for Science & Technology of Advanced Materials - National Nuclear Energy Agency

Show Abstract | Download Original | Original Source | Check in Google Scholar | Full PDF (548.147 KB) | DOI: 10.17146/jusami.2003.5.1.5201

Abstract

STRUCTURAL AND MAGNETIC PROPERTIES OF FE/SI MULTILAYER GROWN BY HELICON PLASMA SPUTTERING. Helicon plasma sputtering method has been used to grown the Fe/Si multilayer (MLs) with various thickness of Silicon spacer around 0.5 ~ 2nm for Fe thickness fixed at 2nm in order to investigated the antiferromagnetic coupling behaviour. Also we grown the MLs with various Fe thickness around 2-5nm for Silicon spacer fixed at tSi =l nm and l.5nm. Present study found that in case of Silicon spacer thickness tSi= l nm multilayer film exhibit antiferromagnetically ordering, beside this thickness the MLs are ferromagnetic. The maximum magnetoresistance ratio is 0.22%, it appears at the Fe thickness tFe=3nm and Si thickness tSi=l nm.
Co-Authors H. Tanoue Isao Sakamoto Setyo Purwanto