Preliminary Study on Nickel Nanoparticle growth by Sputtering Method

Patricia Lubis
Altje Latununuwe
Toto Winata

Prosiding Universitas PGRI Palembang
PROSIDING DOSEN UNIVERSITAS PGRI PALEMBANG EDISI 14

AbstractNickel nanopartickel has been grown on Si (100) substrate by the sputtering method. The growth parameters were 4 x 10-1 Torr pressure, 1500C temperature, 77,3 sccm Argon gas flow and 90, 30,10, 5, 1 minutes deposition time. The as deposited nickel nanoparticles were annealed for 30 minutes and 4 hours. The Nickel nanoparticles were then characterized using Scanning Electron Microscopy (SEM) and Energy Dispersive Analysis X-Ray (EDAX). The smallest size of Nickel nanoparticles found is about 50 nm.Keywords: nanoparticle, sputtering, anneal.