International Journal of Electrical and Computer Engineering
Vol 11, No 1: February 2021

Electrical characterization of si nanowire GAA-TFET based on dimensions downscaling

Abdul-Kadir, Firas Natheer (Unknown)
Hashim, Yasir (Unknown)
Shakib, Muhammad Nazmus (Unknown)
Taha, Faris Hassan (Unknown)

Article Info

Publish Date
01 Feb 2021

Abstract

This research paper explains the effect of the dimensions of Gate-all-around Si nanowire tunneling field effect transistor (GAA Si-NW TFET) on ON/OFF current ratio, drain induces barrier lowering (DIBL), sub-threshold swing (SS), and threshold voltage (VT). These parameters are critical factors of the characteristics of tunnel field effect transistors. The Silvaco TCAD has been used to study the electrical characteristics of Si-NW TFET. Output (gate voltage-drain current) characteristics with channel dimensions were simulated. Results show that 50nm long nanowires with 9nm-18nm diameter and 3nm oxide thickness tend to have the best nanowire tunnel field effect transistor (Si-NW TFET) characteristics.

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Journal Info
International Journal of Electrical and Computer Engineering
Website

Abbrev

IJECE

Publisher

Institute of Advanced Engineering and Science

Subject

Computer Science & IT Electrical & Electronics Engineering

Description

International Journal of Electrical and Computer Engineering (IJECE, ISSN: 2088-8708, a SCOPUS indexed Journal, SNIP: 1.001; SJR: 0.296; CiteScore: 0.99; SJR & CiteScore Q2 on both of the Electrical & Electronics Engineering, and Computer Science) is the official publication of the Institute of ...