Bulletin of Electrical Engineering and Informatics
Vol 5, No 2: June 2016

Selection of Gate Dielectrics for ZnO Based Thin-Film Transistors

Vaibhav Garg (Birla Institute of Technology and Science Pilani)
Navneet Gupta (Birla Institute of Technology and Science Pilani)



Article Info

Publish Date
23 Oct 2016

Abstract

The bulk of semiconductor technology has been based on silicon till today. But silicon has its own limitations. It is not transparent to visible light and hence it cannot be used in certain applications. ZnO is a material which is transparent to visible light. In this paper, we compare the electrical performance of ZnO Thin film Transistors using different gate insulators. Certain performance indices and material indices were considered as the selection criteria for electrical performance. A methodology known as Ashby’s approach was adopted to find out the best gate insulators and based on this methodology various charts were plotted to compare different properties of competing materials. This work concludes that Y2O3 is the best insulator followed by ZrO2 and HfO2.

Copyrights © 2016






Journal Info

Abbrev

EEI

Publisher

Subject

Computer Science & IT Electrical & Electronics Engineering Engineering

Description

Bulletin of Electrical Engineering and Informatics ISSN: 2302-9285 is open to submission from scholars and experts in the wide areas of electrical, electronics, instrumentation, control, telecommunication, computer engineering, computer science, information technology and informatics from the global ...