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Nauval Franata
Universitas Sultan Ageng Tirtayasa
Education

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Pengaruh Medan Magnet Terhadap Morfologi Permukaan Lapisan Tipis yang Difabrikasi Melalui Elektrodeposisi - Mini Review Agusutrisno Marlis Nurut; Ceri Ahendyarti; Fadil Muhammad; Masjudin Masjudin; Dina Estining Tyas Lufianawati; Nauval Franata; Muchtar Ali Setyo Yudono; Imamul Muttakin
Setrum : Sistem Kendali-Tenaga-elektronika-telekomunikasi-komputer Vol 14, No 2 (2025): Edisi Desember 2025
Publisher : Universitas Sultan Ageng Tirtayasa

Show Abstract | Download Original | Original Source | Check in Google Scholar | DOI: 10.62870/setrum.v14i2.36529

Abstract

This mini-review summarizes recent advances in understanding how external magnetic fields influence the surface roughness of thin film produced by electrodeposition. The application of magnetic fields during deposition introduces magnetohydrodynamic (MHD) effects that modify ion transport, nucleation, and lapisan growth behavior. Studies across Fe-, Co-, and Ni-based systems demonstrate that parallel magnetic fields promote smoother, denser, and more uniform deposits by enhancing ionic convection and stabilizing the diffusion layer, whereas perpendicular fields frequently induce columnar or rougher surfaces due to localized microvortices and stress accumulation. The extent of roughness reduction depends nonlinearly on magnetic field intensity—moderate fields (0.3–1.0 T) typically yield optimal smoothing, while excessive fields (>1.5 T) can cause turbulence and morphological instability. Quantitative analyses reveal reductions in RMS roughness of 40–80% under appropriate field conditions, accompanied by refined grain structure and improved lapisan compactness. Overall, magnetic-field-assisted electrodeposition provides a controllable and scalable approach for tailoring thin film morphology, bridging the performance gap between electrochemical and vacuum-based deposition techniques. Its implementation offers new opportunities for developing high-quality film for spintronic devices, magnetic sensors, and microelectronic applications
Co-Authors Agusutrisno Marlis Nurut Ceri Ahendyarti Dina Estining Tyas Lufianawati Imamul Muttakin Masjudin Masjudin Muchtar Ali Setyo Yudono Muhammad Rizki Fadillah