Deposition of NdBa2Cu3O7-δ Thin Films by Pulsed-Laser Ablation Method: Preliminary Study

Togar Saragi (1) Lab. for Electronic Materials Physics, Department of Physics Institut Teknologi Bandung, Jl. Ganesa 10 Bandung 40132 2) FMIPA Universitas Sam Ratulangi, Manado)
A. Fuad (1) Lab. for Electronic Materials Physics, Department of Physics Institut Teknologi Bandung, Jl. Ganesa 10 Bandung 40132. 2)FMIPA Universitas Negeri Malang)
Darsikin Darsikin (1) Lab. for Electronic Materials Physics, Department of Physics Institut Teknologi Bandung, Jl. Ganesa 10 Bandung 40132. 2) FMIPA Universitas Tadulako, Palu)
D. Rusdiana (1) Lab. for Electronic Materials Physics, Department of Physics Institut Teknologi Bandung, Jl. Ganesa 10 Bandung 40132. 2) FMIPA UPI Bandung)
P. Arifin (Lab. for Electronic Materials Physics, Department of Physics Institut Teknologi Bandung, Jl. Ganesa 10 Bandung 40132)
T. Winata (Lab. for Electronic Materials Physics, Department of Physics Institut Teknologi Bandung, Jl. Ganesa 10 Bandung 40132)
M. Barmawi (Lab. for Electronic Materials Physics, Department of Physics Institut Teknologi Bandung, Jl. Ganesa 10 Bandung 40132)

Indonesian Journal of Physics (IJP)
Vol 14 No 4 (2003): IJP Vol. 14 No. 4, October 2003

Deposition of Nd123 thin films have been successfully produced by the pulsed-laser ablation method. The thin films were deposited at a temperature of 730oC on a MgO(100) substrate with varying oxygen flow, the distance between substrate and target, and the deposition time. The oxygen flow was 50-100 sccm, deposition time was 15 to 60 minutes with the oxygen pressure of 180 mTorr. The deposition films had a dark and shiny appearance with 1.731-11.865 Å in thickness. From the SEM and EDAX measurements, it was shown that the surface morphology has a different homogeneity and different stoichiometric composition.