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Togar Saragi
1) Lab. for Electronic Materials Physics, Department of Physics Institut Teknologi Bandung, Jl. Ganesa 10 Bandung 40132 2) FMIPA Universitas Sam Ratulangi, Manado
Astronomy Computer Science & IT Earth & Planetary Sciences Electrical & Electronics Engineering Energy Engineering

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Deposition of NdBa2Cu3O7-δ Thin Films by Pulsed-Laser Ablation Method: Preliminary Study Togar Saragi; A. Fuad; Darsikin Darsikin; D. Rusdiana; P. Arifin; T. Winata; M. Barmawi
Indonesian Journal of Physics Vol 14 No 4 (2003): IJP Vol. 14 No. 4, October 2003
Publisher : Institut Teknologi Bandung

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Abstract

Deposition of Nd123 thin films have been successfully produced by the pulsed-laser ablation method. The thin films were deposited at a temperature of 730oC on a MgO(100) substrate with varying oxygen flow, the distance between substrate and target, and the deposition time. The oxygen flow was 50-100 sccm, deposition time was 15 to 60 minutes with the oxygen pressure of 180 mTorr. The deposition films had a dark and shiny appearance with 1.731-11.865 Å in thickness. From the SEM and EDAX measurements, it was shown that the surface morphology has a different homogeneity and different stoichiometric composition.
Co-Authors A. Fuad D. Rusdiana Darsikin Darsikin M. Barmawi P. Arifin T. Winata