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Journal : Journal of Environmental Engineering and Sustainable Technology

ONE DIMENSIONAL SIMULATION OF DC BIASED ARGON PLASMA USING COMSOL MULTIPHYSICS Dionysius Joseph Djoko Herry Santjojo
Journal of Environmental Engineering and Sustainable Technology Vol 5, No 1 (2018)
Publisher : Lembaga Penelitian dan Pengabdian kepada Masyarakat Universitas Brawijaya

Show Abstract | Download Original | Original Source | Check in Google Scholar | Full PDF (534.132 KB) | DOI: 10.21776/ub.jeest.2018.005.01.3

Abstract

The character of a argon plasma in a DC biased reactor was simulated using 1-dimensional model. The model and simulation was carried out using COMSOL multiphysics software. Results of the simulation show that the model and can be used to predict the character and state of the Ar plasma such as distribution of electron density and Ar+ ion, electron temperature, and electric potential in the plasma space. Furthermore, the model predicts that the argon plasma is formed near the cathode (r<0.5 cm) at the end of the simulation. And, the higher the pressure the higher the plasma density produced at pressures less than 100 Pa.
EFFECT OF CHAMBER PRESSURE ON ELECTRICAL IMPEDANCE OF A LOW-FREQUENCY NITROGEN PLASMA IN A MEDIUM VACUUM REACTOR Dionysius Joseph Djoko Herry Santjojo
Journal of Environmental Engineering and Sustainable Technology Vol 4, No 2 (2017)
Publisher : Lembaga Penelitian dan Pengabdian kepada Masyarakat Universitas Brawijaya

Show Abstract | Download Original | Original Source | Check in Google Scholar | Full PDF (818.933 KB) | DOI: 10.21776/ub.jeest.2017.004.02.4

Abstract

The character of a low-frequency nitrogen plasma in a medium vacuum reactor was studied by determining the effect of chamber pressure on the electrical impedance of the plasma. The system understudied was a mini capacitive plasma reactor utilizing 40 kHz generator. The pressure was varied from 0.4 – 4.7 torrs. Results of this work indicated that the pressure in the range significantly affects the electrical impedance. The increase of the chamber pressure decreased the capacitive reactance while increased the resistance. The capacitive plasma indicates the plasma was controlled by excitation and ionization process, while the resistive plasma exhibits complex reactions due to collisions.