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All Journal Transmisi: Jurnal Ilmiah Teknik Elektro ELKOMIKA: Jurnal Teknik Energi Elektrik, Teknik Telekomunikasi, & Teknik Elektronika Proceeding of the Electrical Engineering Computer Science and Informatics Jurnal Informatika JNKI (Jurnal Ners dan Kebidanan Indonesia) (Indonesian Journal of Nursing and Midwifery) Communications in Science and Technology Jurnal Elektronika dan Telekomunikasi Science Midwifery Journal of Computer Science, Information Technology and Telecommunication Engineering (JCoSITTE) Kartika : Jurnal Ilmiah Farmasi
Zakaria, Hasballah
Institut Teknologi Bandung
Computer Science & IT Control & Systems Engineering Decision Sciences, Operations Research & Management Dentistry Education Electrical & Electronics Engineering Engineering Health Professions Immunology & microbiology Materials Science & Nanotechnology Medicine & Pharmacology Nursing Public Health Social Sciences Veterinary Other

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Comparative Analysis and Mitigation of Extremely Low Frequency (ELF) Magnetic Field Exposure from Smartphone Internal Yudha, Bayu Wira; Zakaria, Hasballah
Jurnal Elektronika dan Telekomunikasi Vol 25, No 2 (2025)
Publisher : National Research and Innovation Agency

Show Abstract | Download Original | Original Source | Check in Google Scholar | DOI: 10.55981/jet.781

Abstract

While public concern regarding smartphone electromagnetic field (EMF) exposure is largely focused on radio frequency (RF) emissions, this study investigates the overlooked extremely low frequency (ELF) magnetic fields originating from internal hardware circuits, such as the Power Management Integrated Circuit (PMIC). This research employs a quantitative experimental methodology to characterize and compare the near-field emissions of two smartphone models with distinct internal architectures: the Xiaomi Redmi Note 8 Pro (12nm mid-range chipset) and the Samsung Galaxy S23 (4nm premium chipset). Magnetic field intensity measurements were conducted using a Hall-effect Gaussmeter, both in free space and with a 3D-printed cubic head phantom fabricated from PETG and filled with a conductive saline-based tissue-simulating liquid (TSL). The primary findings reveal unique ELF emission "fingerprints," where the premium-engineered device exhibits a peak exposure of 0.269 mT—nearly three times lower than its mid-range counterpart at 0.799 mT. Theoretical analysis utilizing the Biot-Savart Law attributes this reduction to the minimized current loop areas inherent in advanced 4nm process nodes compared to older 12nm architectures. Quantitative analysis of mitigation strategies demonstrates that spatial separation (a 15 cm distance) is the most dominant factor, achieving up to 90.7% attenuation, which surpasses the material shielding provided by the phantom (82.0%). Although peak contact exposure can exceed the ICNIRP reference level, the rapid near-field decay ensures compliance at minimal practical distances. This study concludes that ELF exposure is a function of engineering quality rather than network technology, and mitigation is most effectively achieved through physical distance.
Co-Authors Agung Wahyu Setiawan Agwin Fahmi Fahanani Alviana, Ratih Devi Alvin Sahroni Andika Prahasta Astrid Chairini Avianningsih, Reformia Chairini, Astrid DEA, Bambang Hidayat Dimitri Mahayana Elsa Gustianty Fahanani, Agwin Fahmi Faizal Mahananto Garnadi Jafar, Garnadi Hasimun, Patonah Hendra Setiawan Herman Susanto Ira Puspasari Muhammad Nurhalim Shahib Nilam Fitriah Nst, Tuti Adi Tama Nur Andini Nurhalim Shahib PERDHANA, HASBIAN FAUZY Putriyanti, Al-fira R. Maula Rifada Ratih Devi Alfiana Ratih Devi Alviana Rifada, R. Maula Rochmanto, Raditya Artha RUKMAN HERTADI Shahib, Nurhalim Susanty, Meredita Tati Latifah Erawati Rajab Yudha, Bayu Wira