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All Journal Indonesian Journal of Chemistry Jurnal Biomedika dan Kesehatan
Bufaroosha, Muna
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Biochemistry, Genetics & Molecular Biology Chemical Engineering, Chemistry & Bioengineering Chemistry Health Professions Immunology & microbiology Medicine & Pharmacology Public Health

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Enhanced UV Resistance of Poly(methyl methacrylate) Through Schiff Base and Metal Oxide Nanoparticle Incorporation Hussein, Ahmed; Yousif, Emad; Rasheed, Malath; Ahmed, Dina; Bufaroosha, Muna; Kadhom, Mohammed
Indonesian Journal of Chemistry Vol 25, No 2 (2025)
Publisher : Universitas Gadjah Mada

Show Abstract | Download Original | Original Source | Check in Google Scholar | DOI: 10.22146/ijc.97173

Abstract

In this work, a novel poly(methyl methacrylate) (PMMA) material was prepared by incorporating Schiff base and metal oxide nanoparticles (NPs). Hence, different polymer derivatives were produced, and their resistance to light degradation was improved. PMMA was subjected to chemical modification, first by reacting PMMA with an excess of ethylene diamine to reduce the occurrence of cross-linking. Second, it underwent a reaction with the amino group of 4-methoxybenzaldehyde to produce Schiff base molecules. These molecules were subsequently infused with various metal oxide NPs, namely: TiO2, CuO, Cr2O3, Co2O3, and NiO to work as photostabilizers and prepare modified PMMA films. The synthesized polymers were analyzed using Fourier transform infrared (FTIR) and NMR spectroscopy to confirm their structures and determine the extent of structural alterations. FTIR and weight loss measurements assessed modified PMMA's UV stabilization. The effectiveness of functional groups was assessed by monitoring their growth. Additional analyses were done included atomic force microscopy (AFM), scanning electron microscopy (SEM), and microscopic imaging. Unmodified PMMA performed worse than Schiff base polymers. The modified PMMA photodegraded less than the blank films after 300 h of UV exposure. The unit's strong internal conjugation absorbs UV light, which improves performance.
Melindungi Kulit: Tinjauan Komprehensif tentang Tabir Surya Anorganik dan Perannya dalam Fotoproteksi Al-Sayed, Raghda; Ahmed, Dena; Zainulabdeen, Khalid; Waleed, Reem; Bufaroosha, Muna; Hairunisa, Nany; Lestari, Ade Dwi; Widowati, Henie; Ridwan, Alvin Mohamad; Anestessia, Ira Juliet; Yousif, Emad; Panduwati, Lira; Mayasari, Atut Cicih
Jurnal Biomedika dan Kesehatan Vol 8 No 3 (2025)
Publisher : Fakultas Kedokteran Universitas Trisakti

Show Abstract | Download Original | Original Source | Check in Google Scholar | DOI: 10.18051/JBiomedKes.2025.v8.359-373

Abstract

Sunscreens are topical agents that protect the skin from the damaging effects of ultraviolet (UV) radiation, a major contributor to premature aging and skin cancer. These products are typically categorized into two main types: physical (inorganic or mineral) and chemical (organic) sunscreens. Physical sunscreens primarily consist of zinc oxide (ZnO) and titanium dioxide (TiO₂), which reflect and scatter UV rays, thereby providing broad-spectrum protection. Compared with chemical sunscreens, which absorb UV radiation and convert it into heat, inorganic agents are associated with a lower risk of systemic absorption and skin irritation, making them particularly suitable for sensitive skin and pediatric use. This review explores the fundamental mechanisms of action, formulation challenges, and comparative effectiveness of inorganic sunscreens. Special attention is given to their photostability, which contributes to longer-lasting protection, and to their safety profiles in both acute and chronic use. Additionally, recent innovations in nanoparticle technology have enhanced the aesthetic appeal of these agents by reducing visible residue. However, this has also raised new concerns about nanoparticle penetration and environmental impact. Finally, the review addresses public health considerations, including regulatory updates, consumer preferences, and the role of education in promoting informed use of sunscreen.
Co-Authors Ahmed, Dena Ahmed, Dina Al-Sayed, Raghda Anestessia, Ira Juliet Atut Cicih Mayasari Hairunisa, Nany Hussein, Ahmed Kadhom, Mohammed Lestari, Ade Dwi Panduwati, Lira Rasheed, Malath Ridwan, Alvin Mohamad Waleed, Reem Widowati, Henie Yousif, Emad Zainulabdeen, Khalid