Article Per Year (5 Year)
p-Index From 2020 - 2025
1.789
P-Index
This Author published in this journals
All Journal Proceedings of KNASTIK Jurnal Penelitian Pendidikan IPA (JPPIPA) BAREKENG: Jurnal Ilmu Matematika dan Terapan JUTEI (Jurnal Terapan Teknologi Informasi) Journal of Physics and Its Applications IAIC Transactions on Sustainable Digital Innovation (ITSDI) Journal of Fundamental Mathematics and Applications (JFMA) SERVIRISMA: Jurnal Pengabdian kepada Masyarakat Jurnal Sains, Nalar, dan Aplikasi Teknologi Informasi Jurnal Tadris Matematika (JTMT)
Joko Purwadi
Universitas Kristen Duta Wacana
Agriculture, Biological Sciences & Forestry Humanities Astronomy Biochemistry, Genetics & Molecular Biology Chemical Engineering, Chemistry & Bioengineering Chemistry Computer Science & IT Control & Systems Engineering Decision Sciences, Operations Research & Management Earth & Planetary Sciences Economics, Econometrics & Finance Education Electrical & Electronics Engineering Energy Engineering Library & Information Science Materials Science & Nanotechnology Mathematics Mechanical Engineering Physics Transportation Other

Published : 13 Documents Claim Missing Document
Claim Missing Document
Check
Articles

Found 1 Documents
Search
Journal : Journal of Physics and Its Applications

 1 
Influence of annealing on the physical and optical properties of Ge thin films deposited using thermal evaporation Hilmi, Isom; Adam, Muhammad Kevin; Purwadi, Joko; Soesanto, Qidir Maulana Binu; Kusuma, Damar Yoga
Journal of Physics and Its Applications Vol 7, No 2 (2025): May 2025
Publisher : Diponegoro University Semarang Indonesia

Show Abstract | Download Original | Original Source | Check in Google Scholar | DOI: 10.14710/jpa.v7i2.24517

Abstract

Germanium (Ge) is extensively utilized in various technological applications, particularly in optoelectronic devices due to its favorable electronic properties. In this study, Ge thin films were deposited onto soda-lime glass substrates using the thermal evaporation technique. The deposited films were subsequently subjected to annealing at temperatures ranging from 200 to 700 °C. Comprehensive characterization of the films was performed using XRD to analyze crystallinity, UV-Vis spectroscopy to evaluate optical properties, and SEM to investigate surface topography. The annealing process induced a significant phase transformation from an amorphous state to a co-existing Ge and GeO2 structures, as evidenced by XRD measurements. This structural evolution was accompanied by notable changes in the optical properties of the films. Specifically, an increase in annealing temperature resulted in a higher absorbance in the longer wavelength regions of the UV-Vis spectrum. These findings highlight the possibility of a controlled manipulation on the structural and optical characteristics of Ge thin films by thermal treatment, with potential applications in optoelectronic devices.
Co-Authors Adam, Muhammad Kevin Albert Briliakta G S. Antonius Rachmat Chrismanto Argo Wibowo Balisa, Delfia Budi Susanto Bueraheng, Surairee Denna Prestianti Gani Indriyanta Gloria Virginia Gumelar, Bagus Gunawan Santosa Halim Budi Santoso Hilmi, Isom I Nyoman Marcel Mahardika Jong, Jek Siang Kadek Ayu Yanti Pawitri (Prog. Studi Teknik Informatika Fakultas Teknik Universitas Kristen Duta Wac Kusuma, Damar Yoga Liandaru, Putu Gde Qwat Bayu Minarni, Nani Ningsih, Zhilvia Noviana Nugroho Agus H. Nugroho Agus Haryono Nur Muallifah, Azizah Restiani, Yulia Rosa Delima Sevina, Grisselia Rizky Soesanto, Qidir Maulana Binu Soffi Widyanesti Priwantoro, Soffi Widyanesti Syariful Fahmi, Syariful Theresa Mariana Kurniasih Triyoga, Arilia Widiantoro, Tri