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Sagir Alva
Universitas Mercu Buana
Aerospace Engineering Automotive Engineering Biochemistry, Genetics & Molecular Biology Chemical Engineering, Chemistry & Bioengineering Chemistry Civil Engineering, Building, Construction & Architecture Control & Systems Engineering Education Electrical & Electronics Engineering Energy Engineering Industrial & Manufacturing Engineering Languange, Linguistic, Communication & Media Materials Science & Nanotechnology Mathematics Mechanical Engineering Other

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DEVELOPMENT AND CHARACTERIZATION OF SOLID CU / CUSO4 REFERENCE ELECTRODES Marysca Shintya Dewi; Sagir Alva; Wan Adil Wan Jamil
International Journal of Innovation in Mechanical Engineering and Advanced Materials Vol. 3 No. 1 (2021)
Publisher : Universitas Mercu Buana

Show Abstract | Download Original | Original Source | Check in Google Scholar | DOI: 10.22441/ijimeam.v3i1.11607

Abstract

In this research, a solid Cu/CuSO4 reference electrode has been developed. In this development process, the Cu/CuSO4 solid reference electrode provided consists of two types, namely the Cu/CuSO4 I solid reference electrode (ERP Cu/CuSO4 I) and the Cu/CuSO4 II solid reference electrode (ERP Cu/CuSO4 II). ERP Cu/CuSO4 I was prepared using two layers, namely the Cu/CuSO4 layer and the cellulose acetate layer which were placed sequentially on the surface of the planar type Cu electrode. Meanwhile, ERP Cu/CuSO4 II was prepared using three layers, namely a layer of cotton fiber/cellulose acetate, a layer of Cu/CuSO4, and a layer of cotton/cellulose acetate placed in sequence on the surface of the planar type Cu electrode, where the CuSO4 layer is between the two layers of cotton/cellulose acetate. Both types of Cu/CuSO4 solid reference electrodes were characterized by testing DmV in various concentrations of KCl solution and ERP Cu/CuSO4 II has been produced as the best reference electrode for Cu/CuSO4 solids with a DmV value of 3.3 mV. Furthermore, ERP Cu/CuSO4 II was selected for characterization using cyclic voltammetry (CV) testing, response vs Cl sensor testing, and drif testing. In CV testing, ERP Cu/CuSO4 provides a voltammogram graph pattern similar to the Ag/AgCl reference electrode as a commercial reference electrode. Meanwhile, in testing the response vs sensor Cl, ERP Cu/CuSO4 II gave a Nernstian number value  of -50.1 mV/decade with a test range of 0.1-10-3 M. ERP Cu/CuSO4 II showed fairly good stability, namely with a drift value of 0.46 mV/minute which is achieved after the conditioning process after 12 minutes.
Co-Authors Aap Pandriana Adelfy Dara Arianti Agnes Hanna Patty, Armin Naibaho, Singgih Fitra Utama, Ahmad Ariri Ahmad Kamal Arifin Aiman Sajidah Abd Aziz Aiman Sajidah binti Abdul Aziz Albert Phak Jie Wong Alfian Noviyanto Ali Rinaldi Andi Firdaus Sudarma Arianti, Adelfy Dara Arifin, Ahmad Kamal Ariri, Ahmad Asadullah, Mas'ud Asadullah, Masud Asep Setia Kristanto Baihaqi Baihaqi Basyari, Aziz Binawati Ginting Dafit Feriyanto Dayanti, Meri Deni Shidqi Khaerudini Dianta Ginting Edy Herianto Majlan Eka Safitri Eka Safitri Elin Yusibani Elly Sufriadi Fadhilla, Eky Nur Fadilah, Arif Fidi Fidi Fidi, Fidi Fitri Dara Fonna, Syafrizal Friliandita, Vivi Hadi Pranoto Hasbullah, Siti Aishah I Gusti Ayu Arwati Ibdal Satar Iqhrammullah, Muhammad Julinawati Julinawati Julinawati, Julinawati Khairi Suhud KHAIRI SUHUD Kurniawan Kurniawan Kurniawan Kurniawan Leni Heliawati Marysca Shintya Dewi Mas'ud Asadullah Mohd Ismahadi bin Syono Muhammad Farhan Muhammad Isa Mustanir Mustanir Nurul Islami, Nurul Pandriana, Aap Popy Yuliarty Pudjiwati, Sri Resista Vikaliana Resmi Bestari Muin Rinaldi, Ali Rini Anggraini Robi Suherman Rohadi Satrio Budi Utomo Siti Aishah Hasbullah Subekti Subekti Suhud, Khairi Sukendar Sukendar Sukoma, Sukoma Sundari, Rita Supaat Zakaria Surbakti, Muhammad Syukri Suyadi, Yadi Swandya Eka Pratiwi Syafrizal Fonna Tarigan, Kontan Teddy Kurniawan Thasyah Pitanova Vivi Friliandita Wahyu Irwansyah Wahyudi, Haris Wan Adil bin Wan Jamil Wan Adil Wan Jamil Yeyen Maryani Zakaria Zakaria Zulnazri, Z